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KemLab™ KL 5300 series positive photoresists are designed for use in i-Line, g-Line and broadband applications. They offer high sensitivity, high resolution and excellent process latitude.

Key Advantages of KemLab™ KL 5300 Photoresists::

  • Cover 0 to 2.5µm in a single coat.
  • Designed for use with industry standard TMAH 0.26 Normal photoresist developers.
  • Achieve resolutions of 0.55µm.
  • Competes with S1805™, S1808™, S1811™, S1813™, S1818™ photoresists.
  • Both custom packaging sizes and production volumes are available upon request.

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